Conference presentations

1. K. Koshelev et al., High power EUV discharge-produced plasma source based on liquid tin jet electrodes , 2012 International Symposium on Extreme Ultraviolet Lithography (Brussels, Belgium 2012)
2. K. Koshelev et al., Current Status and Future of EUV and BEUV Sources , 2011 International Workshop on EUV and Soft X-ray Sources (Dublin, Ireland 2011)
3. V. Krivtsun et al., Studies of Gd and Tb radiation in 6.x nm spectral region , 2011 International Workshop on EUV and Soft X-ray Sources (Dublin, Ireland 2011)
4. V. Medvedev et al., Comparison of Spectra of Accelerated Ions Produced by LPP and DPP , 23rd Symposium on Plasma Physics and Technology, (Prague, Czech Republic 2008)
5. G.G. Zukakishvili et al., Generation of Fast Ions in Vacuum Sparks , 23rd Symposium on Plasma Physics and Technology, (Prague, Czech Republic 2008)
6. V. Krivtsun et al., High Reprate Vacuum Spark with two Liquid Metal Jet Electrodes as VUV Source , 23rd Symposium on Plasma Physics and Technology, (Prague, Czech Republic 2008) link to file
7. V. Ivanov et al., RZLINE+THERMOS-BEELINE — a New Numerical Instrument for Modeling of Dynamics of Strongly Radiating Plasmas 23rd Symposium on Plasma Physics and Technology, (Prague, Czech Republic 2008)

Patents

1. V.Ye. Banine, V.V. Ivanov, K.N. Koshelev, R.R. Gayazov, V.M. Krivtsun, Electromagnetic radiation source, lithographic apparatus, device manufacturing method and device manufactured thereby, US 2007/0069159 A1, 29 March 2007
2. L.P. Bakker, V.Ye. Banine, V.V. Ivanov, K.N. Koshelev, V.M. Krivtsun, Lithographic apparatus with contamination suppression, device manufacturing method and device manufactured thereby, US 2005/0122491 A1, 9 June 2005
3. V.V. Ivanov, V.Ye. Banine, K.N. Koshelev, V.M. Krivtsun, Plasma radiation source for a lithographic apparatus, US 2008/0137050 A1, 12 June 2008
4. Yu.V. Sidelnikov, V.Ye. Banine, K.N. Koshelev, V.M. Krivtsun, Extreme ultraviolet radiation source and method for producing extreme ultraviolet radiation, US 2011/0020752 A1, 27 January 2011
5. A.M. Yakunin, V.Ye. Banine, V.V. Ivanov, E.R. Loopstra, V.M. Krivtsun, G.H.P.M. Swinkels, D. Labetski, Radiation source and lithographic apparatus, US 2011/0164236 A1, 7 July 2011
6. V.M. Krivtsun, V.Ye. Banine, A.J. Bleeker, V.V. Ivanov, K.N. Koshelev, J.H.J. Moors, S. Churilov, D. Glushkov, Target material, a source, an EUV lithographic apparatus and a device manufacturing method using the same, US 2011/0043777 A1, 24 February 2011
7. V.V. Ivanov, V.Ye. Banine, V.M. Krivtsun, Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby, US 2008/0067453 A1, 20 March 2008
8. V.Ye. Banine, V.V. Ivanov, J.J. Smits, H.-J. Voorma, L.A. van den Wildenberg, V.M. Krivtsun, A.M. Struycken, Ex-situ removal of deposition on an optical element, US 2007/0069162 A1, 29 March 2007

Journal articles

1. V.Ye. Banine, K.N. Koshelev and G.H.P.M. Swinkels, Physical processes in EUV sources for microlithography, Journal of Physics D: Applied Physics , Vol. 44, pp. 253001-1-18 (2011)
2. V.V. Medvedev, A.E. Yakshin, R.W.E. van de Kruijs, V.M. Krivtsun, A.M. Yakunin, K.N. Koshelev, and F. Bijkerk, Infrared suppression by hybrid EUV multilayer – IR etalon structures, Optics Letters , Vol. 36, pp. 3344-3346 (2011)
3. P.S. Antsiferov, L.A. Dorokhin, and K.N. Koshelev, Plasma production by means of discharge in a spherical cavity Journal of Applied Physics , Vol. 107, pp. 103306-1-4 (2010)
4. P.S. Antsiferov, L.A. Dorokhin, Yu.V. Sidelnikov, and K.N. Koshelev, Fast discharge in a plasma gun with hemispherical insulator, Journal of Applied Physics , Vol. 105, pp. 103305-1-3 (2009)
5. S.S. Churilov, R.R. Kildiyarova, A.N. Ryabtsev and S.V. Sadovsky, EUV spectra of Gd and Tb ions excited in laser-produced and vacuum spark plasmas, Physica Scripta , Vol. 80, pp. 045303-1-3 (2009)
6. M. Bolshov, Yu. Kasyanov, R. Feshchenko, V. Krivtsun, V. Ivanov, K. Koshelev, Investigation of the dynamic of an expanding laser plume by a shadowgraphic technique, Spectrochimica Acta Part B , Vol. 63, pp. 324-331 (2008)
7. K.N. Koshelev, V.Ye. Banine, N.N. Salashchenko, “Research and development in short-wave radiation sources for new-generation lithography”, Physics – Uspekhi , Vol. 50, pp. 741-744 (2007)
8. V.G. Novikov, V.V. Ivanov, K.N. Koshelev, V.M. Krivstun, A.D. Solomyannaya, Calculation of tin emission spectra in discharge plasma: The influence of reabsorption in spectral lines, High Energy Density Physics , Vol. 3, pp. 198-203 (2007)
9. V. V. Ivanov, P. S. Antsiferov, K. N. Koshelev, M. R. Akdim, and F. Bijkerk, Numerical Simulation of the Creation of a Hollow Neutral-Hydrogen Channel by an Electron Beam, Physical Review Letters Vol. 97, pp. 205007-1-4 (2006)
10. S.S. Churilov and A.N. Ryabtsev, Analyses of the Sn IX-Sn XII spectra in the EUV region, Physica Scripta , Vol. 73, pp. 614-619 (2006)
11. K.N. Koshelev, H.-J. Kunze, R. Gayazov, V. Gomozov, V.V. Ivanov, V.G. Koloshnikov, E.D. Korop, V. Krivtsun, Yu.V. Sidelnikov, O. Yakushev, and G.G. Zukakishvili, Radiative Collapse in Z Pinches, EUV Sources for Lithography , Chapter 6, SPIE Press (2006)
12. I.Yu. Tolstikhina, S.S. Churilov, A.N. Ryabtsev, and K.N. Koshelev, Atomic Tin Data, EUV Sources for Lithography , Chapter 4, SPIE Press (2006)
13. E.R. Kieft, J.J.A.M van der Mullen, G.M.W. Kroesen, V. Banine, K.N. Koshelev, Characterization of a vacuum-arc discharge in tin vapor using time-resolved plasma imaging and extreme ultraviolet spectrometry, Physical Review E , Vol. 71, pp. 026409-1-7 (2005)